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POLOS Spin 150i Spin Coater

Specifications

  • Spin speed up to 12,000 rpm
  • Spin acceleration up to 51,000 rpm/s
  • Substrate sizes from 5mm up to 150mm diameter wafer or 20mm x 20mm substrates
  • Multistep and multicycle programming
  • Clockwise and counter-clockwise spin
  • Puddle function
  • Wash function
  • Central dispensing syringe option
  • Vacuum chucks and fragment chuck

Contact
Hartmut Hedderich
BRWN 4165B
560 Oval Drive
West Lafayette, IN 47907
(765) 494-6543
Email: hhedderi@purdue.edu