POLOS Spin 150i Spin Coater
Specifications
- Spin speed up to 12,000 rpm
- Spin acceleration up to 51,000 rpm/s
- Substrate sizes from 5mm up to 150mm diameter wafer or 20mm x 20mm substrates
- Multistep and multicycle programming
- Clockwise and counter-clockwise spin
- Puddle function
- Wash function
- Central dispensing syringe option
- Vacuum chucks and fragment chuck
Contact
Na Gou
BRWN 3154A
560 Oval Drive
West Lafayette, IN 47907
(765) 494-7188
Email: ngou@purdue.edu
