POLOS Spin 150i Spin Coater

Specifications

Spin speed up to 12,000 rpm
Spin acceleration up to 51,000 rpm/s
Substrate sizes from 5mm up to 150mm diameter wafer or 20mm x 20mm substrates
Multistep and multicycle programming
Clockwise and counter-clockwise spin
Puddle function
Wash function
Central dispensing syringe option
Vacuum chucks and fragment chuck

Contact

Na Gou
BRWN 3154A
560 Oval Drive
West Lafayette, IN 47907
(765) 494-7188
Email: ngou@purdue.edu

Instrumentation Center
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